Analysis of ion orbits in front of a negative planar electrode immersed in an oblique magnetic field

The orbital motion approach is used to analyze the ion impact on a negatively biased planar wall immersed in strongly magnetized plasma. It assumed that given homogeneous magnetic field forms small angle with electrode, while inhomogeneous electric perpendicular electrode. Spatial dependence of modeled such way exhibits two-scale behavior, which characteristic plasma sheath problems. equation singly charged deuterium solved for large variety parameters and initial conditions. effects electrode bias, flux density, angle, velocity, scaling, bias are investigated. found angles ions distributed over surprisingly wide range, vast majority cases, several times larger than angle. study relevant analysis flow electrodes fusion plasmas, i.e., divertors tokamaks.